Elements of plasma technology /

Saved in:

Bibliographic Details
Author / Creator:	Wong, Chiow-San.
Imprint:	Singapore : Springer, 2016. ©2016
Description:	1 online resource (xi, 123 pages : 105 illustrations, 93 illustrations in color)
Language:	English
Series:	SpringerBriefs in applied sciences and technology, 2191-530X SpringerBriefs in applied sciences and technology.
Subject:	Plasma (Ionized gases) -- Industrial applications. Plasma (Ionized gases) Plasma (Ionized gases) -- Industrial applications. Plasma (Ionized gases) Electronic books.
Format:	E-Resource Book
URL for this record:	http://pi.lib.uchicago.edu/1001/cat/bib/11251539

Hidden Bibliographic Details
Other authors / contributors:	Mongkolnavin, Rattachat.
ISBN:	9789811001178 9811001170 9789811001154 9811001154
Digital file characteristics:	text file PDF
Notes:	Includes bibliographical references. Print version record.
Summary:	This book presents some fundamental aspects of plasma technology that are important for beginners interested to start research in the area of plasma technology . These include the properties of plasma, methods of plasma generation and basic plasma diagnostic techniques. It also discusses several low cost plasma devices, including pulsed plasma sources such as plasma focus, pulsed capillary discharge, vacuum spark and exploding wire; as well as low temperature plasmas such as glow discharge and dielectric barrier discharge which the authors believe may have potential applications in industry. The treatments are experimental rather than theoretical, although some theoretical background is provided where appropriate. The principles of operation of these devices are also reviewed and discussed.
Other form:	Print version: 9789811001154
Standard no.:	10.1007/978-981-10-0117-8

Similar Items