Electrical resistivity of thin metal films /

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Bibliographic Details
Author / Creator:Wissmann, P. (Peter), 1936-
Imprint:Berlin ; New York : Springer, ©2007.
Description:1 online resource (vi, 126 pages) : illustrations.
Language:English
Series:Springer tracts in modern physics ; 223
Springer tracts in modern physics ; 223.
Subject:
Format: E-Resource Book
URL for this record:http://pi.lib.uchicago.edu/1001/cat/bib/11065871
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Other authors / contributors:Finzel, Hans-Ulrich.
ISBN:3540484884
9783540484882
9783540484905
3540484906
Notes:Includes bibliographical references and index.
Summary:"The aim of the book is to give an actual survey on the resistivity of thin metal and semiconductor films interacting with gases. We discuss the influence of the substrate material and the annealing treatment of the films, presenting our experimental data as well as theoretical models to calculate the scattering cross section of the conduction electrons in the frame-work of the scattering hypothesis. Main emphasis is laid on the comparison of gold and silver films which exhibit nearly the same lattice structure but differ in their chemical activity. In conclusion, the most important quantity for the interpretation is the surface charging z while the correlation with the optical data or the frustrated IR vibrations seem to show a more material-specific character. Z can be calculated on the basis of the density functional formalism or the self-consistent field approximation using Mulliken's population analysis."--Jacket.
Other form:Print version: Wissmann, P. (Peter), 1936- Electrical resistivity of thin metal films. Berlin ; New York : Springer, ©2007 3540484884 9783540484882