Hf-based high-k dielectrics : process development, performance characterization, and reliability /
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Author / Creator: | Kim, Young-Hee, 1972- |
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Edition: | 1st ed. |
Imprint: | San Rafael, Calif. (1537 Fourth Street, San Rafael, CA 94901 USA) : Morgan & Claypool Publishers, c2005. |
Description: | 1 electronic text (x, 92 p. : ill.) : digital file. |
Language: | English |
Series: | Synthesis lectures on solid state materials and devices, 1932-1724 ; #1 Synthesis lectures on solid state materials and devices (Online), #1. |
Subject: | Dielectrics. Hafnium oxide. Integrated circuits -- Reliability. Semiconductors -- Junctions. Breakdown (Electricity) Metal oxide semiconductor field-effect transistors. Breakdown (Electricity) Dielectrics. Hafnium oxide. Integrated circuits -- Reliability. Metal oxide semiconductor field-effect transistors. Semiconductors -- Junctions. |
Format: | E-Resource Book |
URL for this record: | http://pi.lib.uchicago.edu/1001/cat/bib/8512758 |