Chemical vapour deposition ; Precursors, processes and applications /
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Imprint: | Cambridge, Royal Society of Chemistry, 2008. |
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Description: | 600 p. : 202 b&w, ill. |
Language: | English |
Format: | E-Resource Book |
URL for this record: | http://pi.lib.uchicago.edu/1001/cat/bib/7984498 |
Table of Contents:
- An overview of CVD processes
- CVD reactors and delivery systems
- Modeling CVD processes
- ALD processes
- Basic chemistry of CVD precursors
- MOCVD of III-V semiconductors
- MOCVD of II-VI semiconductors
- CVD of metals
- CVD of oxides used in microelectronics
- CVD of metal nitride films
- CVD of functional coatings on glass
- CVD of optical coatings
- CVD of hard protective coatings
- Photon-assisted MOCVD processes
- Plasma-assisted MOCVD processes
- Commercial aspects of CVD