Electron beam induced damage in PECVD Si₃N₄ and SiO₂ films on InP /

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Bibliographic Details
Imprint:	[Washington, D.C.] : NASA ; Springfield, Va. : For sale by the National Technical Information Service, [1990]
Description:	15 p. : ill. ; 28 cm.
Language:	English
Series:	NASA technical memorandum ; 102544
Subject:	Dielectric films. Dielectric films.
Format:	E-Resource U.S. Federal Government Document Book
URL for this record:	http://pi.lib.uchicago.edu/1001/cat/bib/6504519

Hidden Bibliographic Details
Other authors / contributors:	Pantic, Dragan M. Electrochemical Society. United States. National Aeronautics and Space Administration. Symposium on Dielectric Films on Compound Semiconductors.
Notes:	Cover title. Includes bibliographical references (p. 13). Available via Internet from the NASA Technical Report Server web site. Address as of 5/9/06: http://ntrs.nasa.gov/archive/nasa/casi.ntrs.nasa.gov/19900011077%5F1990011077.pdf ; current access is available via PURL.
GPO item no.:	0830-D (MF) 0830-D (online)
Govt.docs classification:	NAS 1.15:102544

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