X-ray diffraction at elevated temperatures : a method for in situ process analysis /

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Bibliographic Details
Imprint:New York : VCH, c1993.
Description:viii, 268 p. : ill. ; 24 cm.
Language:English
Subject:X-rays -- Diffraction
X-rays -- Industrial applications
X-rays -- Diffraction.
X-rays -- Industrial applications.
Format: Print Book
URL for this record:http://pi.lib.uchicago.edu/1001/cat/bib/1471845
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Other authors / contributors:Chung, Deborah D. L.
ISBN:0895737450
3527278427
Notes:Includes bibliographical references and index.